Crosscheck Powered by iThenticate will be used for plagiarism check. The amount of duplication from previously published content should be less than 20%; If the amount of duplication is 20% - 35%, modification maybe required; if the amount of duplication exceeds 35%, the article will be rejected. Please note that there will be no refund for no-shows.
The Second International Conference on Graphics Processing, Recognition, and Machine Learning (GPRML 2026) is about to be held in the beautiful coastal city of Lianyungang. This conference focuses on the latest developments and technological breakthroughs in the fields of graphics processing, pattern recognition, and machine learning, aiming to provide a high-level communication platform for scholars, researchers, and industry experts worldwide to jointly explore the challenges and opportunities in these areas. **Meeting Highlights * *: -* * Interdisciplinary Dialogue * *: GPRML 2026 will bring together professionals from multiple fields such as graphics processing, pattern recognition, and machine learning to promote interdisciplinary communication and collaboration. -Frontier Technology Seminar: The conference will showcase the most advanced research achievements and technological applications in the fields of graphics processing, pattern recognition, and machine learning. -* * Practical Case Sharing * *: Participants will have the opportunity to listen to successful case introductions from the industry and understand how new technologies can solve complex problems in practice. -* * Promoting International Cooperation * *: The conference aims to strengthen academic and technological exchanges between countries, providing participants with opportunities to broaden their international perspectives and establish cooperative relationships. **Expected outcome * *: -Academic Achievement Sharing: Through expert speeches, thematic discussions, and other forms, promote in-depth understanding of the latest theories and technologies in the fields of graphics processing, recognition, and machine learning in the academic community. -* * Technological Innovation Exhibition * *: Showcasing new methods of graphic processing and pattern recognition, as well as new algorithms of machine learning, to bring technological innovation to the industry. -Industrial Cooperation Opportunities: The conference will provide a good platform for participants to seek potential partners and jointly promote technological progress and industrial development in related fields. GPRML 2026 is committed to building an open and active knowledge exchange environment, encouraging deep communication and cooperation among participants, and jointly exploring the development prospects of graphics processing, recognition, and machine learning fields.
Submission Deadline
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Power System
Power Grid System
Electrical Testing
Electrical Engineering
Energy, Electricity, and Electrical
Electric Traction
Electricity Market
Calculations and Predictions Related to Capacitance, Resistance, Voltage, Etc
Motor and Drive
Friction and Wear
Mechanical Engineering
Welding and Connection
Instrumentation and Equipment
Heat Generation and Conduction
Load Calculation and Forecasting
Microcontrollers and Applications
Converter
1. The manuscript must be written in English; 2. The manuscript shall be typeset according to the template standard, with at least 4 pages; 3. The theme of the paper shall be related to the theme of the meeting; 4. Plagiarism and plagiarism are prohibited, and multiple submissions are prohibited; 5. It shall have certain innovation, scientific research value and application value;
Please submit the full text/abstract of the paper to us through the electronic submission system
Consulting serviceIf you have any questions or need any assistance regarding the meeting, please feel free to contact our meeting experts at any time:
Mr. Wang
WeChat/TEL: 132 6078 0457
QQ: 2031670594
E-mail: mact@sub-paper.com
